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Styrene and adamantane monomers for photoresists
Polymerizable monomers and their precursors for microelectronics and lithography.
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Catalog items
Summary table for this section
| Substance | Chemical formula | CAS number | Applications |
|---|---|---|---|
| 2-Adamantanone | C10H14O | 700-58-3 | Starting material for adamantane derivatives for pharmaceuticals and lithography. |
| 2-Isopropyl-2-adamantyl methacrylate | C17H26O2 | 297156-50-4 | Monomer for chemically amplified photoresists. |
| 3-Vinylbenzyl chloride | C9H9Cl | 39833-65-3 | Monomer and polymer modifier for introducing reactive groups. |
| 4-Acetoxystyrene | C10H10O2 | 2628-16-2 | Precursor of poly(hydroxystyrene) for photoresists. |
| 4-tert-Butoxystyrene | C12H16O | 95418-58-9 | Monomer for photoresists (protected hydroxyl group). |
| 4-Vinylbenzyl chloride | C9H9Cl | 1592-20-7 | Monomer for ion-exchange resins and reactive polymers. |
| 5-Hydroxy-2-adamantanone | C10H14O2 | 20098-14-0 | Intermediate for adamantane monomers in photoresists. |
Data is taken from the manufacturer's 2026 catalog. Specifications are confirmed when ordering and may be changed by the manufacturer.